The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Oct. 15, 2001
Mark N. Kawaguchi, Palo Alto, CA (US);
Huong T. Nguyen, San Ramon, CA (US);
Nikolaos Bekiaris, San Jose, CA (US);
James S. Papanu, San Rafael, CA (US);
Mark N. Kawaguchi, Palo Alto, CA (US);
Huong T. Nguyen, San Ramon, CA (US);
Nikolaos Bekiaris, San Jose, CA (US);
James S. Papanu, San Rafael, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of photoresist removal is described. A substrate is located in a processing chamber. A mixture of gases is excited, the mixture comprising a majority component of a reducing process gas and a minority component of between 0.1% and 10% by volume of an oxidizing process gas. Reactive gas species are thereby generated. A photoresist layer with an exposed dielectric layer on the substrate in the chamber is then exposed to the reactive gas mixture to selectively remove the photoresist layer from the dielectric layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile