The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2005

Filed:

May. 30, 2002
Applicants:

Vladimir Rodov, Redondo Beach, CA (US);

Paul Chang, Saratoga, CA (US);

Gary M. Hurtz, Pleasanton, CA (US);

Geeng-chuan Chern, Cupertino, CA (US);

Jianren Bao, Fullerton, CA (US);

Inventors:

Vladimir Rodov, Redondo Beach, CA (US);

Paul Chang, Saratoga, CA (US);

Gary M. Hurtz, Pleasanton, CA (US);

Geeng-Chuan Chern, Cupertino, CA (US);

Jianren Bao, Fullerton, CA (US);

Assignee:

APD Semiconductor, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L029/76 ; H01L029/94 ; H01L031/062 ; H01L031/113 ; H01L031/119 ;
U.S. Cl.
CPC ...
Abstract

A power device having vertical current flow through a semiconductor body of one conductivity type from a top electrode to a bottom electrode includes at least one gate electrode overlying a gate insulator on a first surface of the body, a channel region of second conductivity type in the surface of the body underlying all of the gate electrode, a first doped region of the second conductivity type contiguous with the channel region and positioned deeper in the body than the channel region and under a peripheral region of the gate electrode, and a second doped source/drain region in the surface of the body abutting the channel region and adjacent to the gate electrode. When the gate is forward biased, an inversion region extends through the channel region and electrically connects the first electrode and the second electrode with a small Vnear to the area between adjacent P bodies being flooded with electrons and denuded of holes. Therefore, at any forward bias this area conducts as an N-type region. When the gate electrode is reverse biased, the long channel region underlying the full length of the gate electrode reduces reverse leakage current.


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