The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
Jul. 25, 2003
Chien-chao Huang, Hsin-Chu, TW;
Tone-xuan Chung, Kaohsiung, TW;
Cheng-chuan Huang, Kinmen, TW;
Fu-liang Yang, Hsin-Chu, TW;
Chien-Chao Huang, Hsin-Chu, TW;
Tone-Xuan Chung, Kaohsiung, TW;
Cheng-Chuan Huang, Kinmen, TW;
Fu-Liang Yang, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A semiconductor device includes a substrate and a gate region on top of a substrate. First and second gate sidewall liners are situated on first and second sides of the gate region respectively, the first and second sidewall liners having a vertical part contacting sidewalls of the gate region and a horizontal part contacting the substrate. First and second recessed spacers are situated on top of the first and second sidewall liners respectively. The height of the first and second spacers is lower than the height of the gate sidewall liner whereas the width of the horizontal part of the sidewall liner is shorter than the width of the spacer.