The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2005

Filed:

Oct. 20, 2003
Applicants:

Eric A. H. Timmermans, Eindhoven, NL;

Maarten J. Teepen, Bilthoven, NL;

Raffaele Mucciato, Rome, IT;

Rudi Wilhelm, Bilthoven, NL;

Inventors:

Eric A. H. Timmermans, Eindhoven, NL;

Maarten J. Teepen, Bilthoven, NL;

Raffaele Mucciato, Rome, IT;

Rudi Wilhelm, Bilthoven, NL;

Assignee:

ASM International N.V., Bilthoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/31 ; H01L021/469 ;
U.S. Cl.
CPC ...
Abstract

A method is provided for obtaining stable and elevated deposition rates in a reaction chamber, following the cleaning of the chamber. The method involves cleaning of the chamber, pre-coating the interior surfaces of the reaction chamber with an inorganic composition, and then, using the pre-coated chamber to deposit an organic layer onto a workpiece.

Published as:
US2005085098A1; JP2005129929A; US6974781B2;

Find Patent Forward Citations

Timmermans, Eric A. H.. (2005). Reactor precoating for reduced stress and uniform cvd (U.S. Patent No. 6974781). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6974781

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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