The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
May. 12, 2002
Applicants:
Kay Ming Lee, Pai, SG;
Cheng-wen Fan, Hsin-Chu, TW;
Jiunn-ren Hwang, Hsin-Chu, TW;
Chih-chiang Liu, Hsin-Chu, TW;
Inventors:
Kay Ming Lee, Pai, SG;
Cheng-Wen Fan, Hsin-Chu, TW;
Jiunn-Ren Hwang, Hsin-Chu, TW;
Chih-Chiang Liu, Hsin-Chu, TW;
Assignee:
United Microelectronics Corp., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
A method of correcting a mask layout is provided. The mask layout includes a plurality of element patterns. An inspection program is executed to classify the element patterns of the mask layout into a plurality of element pattern types according to a pattern density of the element patterns. Following this, each of the element pattern types is corrected so as to prevent a plasma micro-loading effect.