The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2005
Filed:
Jun. 26, 2003
Jeffrey S. Hartlove, Rolling Hills Estates, CA (US);
Mark E. Michaelian, Lomita, CA (US);
Henry Shields, San Pedro, CA (US);
Samuel Talmadge, Agoura Hills, CA (US);
Steven W. Fornaca, Torrance, CA (US);
Armando Martos, Chesterfield, MO (US);
Jeffrey S. Hartlove, Rolling Hills Estates, CA (US);
Mark E. Michaelian, Lomita, CA (US);
Henry Shields, San Pedro, CA (US);
Samuel Talmadge, Agoura Hills, CA (US);
Steven W. Fornaca, Torrance, CA (US);
Armando Martos, Chesterfield, MO (US);
University of Central Florida Research Foundation, Inc., Orlando, FL (US);
Abstract
An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20–200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.