The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2005
Filed:
Mar. 04, 2003
Tatehito Usui, Chiyoda, JP;
Motohiko Yoshigai, Hikari, JP;
Kazuhiro Jyouo, Kudamatsu, JP;
Tetsuo Ono, Iruma, JP;
Tatehito Usui, Chiyoda, JP;
Motohiko Yoshigai, Hikari, JP;
Kazuhiro Jyouo, Kudamatsu, JP;
Tetsuo Ono, Iruma, JP;
Hitach High-Technologies Corporation, Tokyo, JP;
Abstract
When a semiconductor wafer placed in a chamber and having films thereon is etched using plasma generated in the chamber, a change in the amount of lights with at least two wavelengths, obtained from the wafer surface during the processing, is detected. The time between the time at which the amount of a light with one of two wavelengths is maximized and the time at which the amount of a light with the other wavelength is minimized is compared with a predetermined value to determine the state of etching processing.