The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2005
Filed:
Jul. 14, 2003
Applicants:
Jan Evert Van Der Werf, Waalre, NL;
George Arie Jan Fockert, Apeldoom, NL;
Hans Van Der Laan, Veldhoven, NL;
Inventors:
Jan Evert Van Der Werf, Waalre, NL;
George Arie Jan Fockert, Apeldoom, NL;
Hans Van Der Laan, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/54 ; G03B027/42 ; G01B011/00 ;
U.S. Cl.
CPC ...
Abstract
A reflector alignment system uses an alignment beam propagating through a projection system that includes a mirror group to measure the apparent relative positions of two reference marks fixed to a reference frame on opposite sides of the projection system. Any movement of mirrors in the projection system will be detected as a shift in the apparent position of the reference marks.