The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2005
Filed:
Dec. 10, 2002
Takeru Watanabe, Niigata-ken, JP;
Takeshi Kinsho, Niigata-ken, JP;
Koji Hasegawa, Niigata-ken, JP;
Tsunehiro Nishi, Niigata-ken, JP;
Mutsuo Nakashima, Niigata-ken, JP;
Seiichiro Tachibana, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Takeru Watanabe, Niigata-ken, JP;
Takeshi Kinsho, Niigata-ken, JP;
Koji Hasegawa, Niigata-ken, JP;
Tsunehiro Nishi, Niigata-ken, JP;
Mutsuo Nakashima, Niigata-ken, JP;
Seiichiro Tachibana, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH)— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.