The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2005
Filed:
Sep. 09, 2002
Tsung-han Peng, Hsinchu, TW;
Ding-chien Chien, Hsinchu, TW;
Chung-hsin Liu, Hsinchu, TW;
Chih-chia Hsu, Hsinchu, TW;
Tsung-Han Peng, Hsinchu, TW;
Ding-Chien Chien, Hsinchu, TW;
Chung-Hsin Liu, Hsinchu, TW;
Chih-Chia Hsu, Hsinchu, TW;
Macronix International Co., Ltd., Hsinchu, TW;
Abstract
A method for monitoring overlay alignment on a wafer that includes identifying a target machine, identifying a target process, identifying a plurality of critical layers, obtaining a plurality of overlay data from at least one of designated registration patterns on the wafer as baseline data, providing a plurality of reference overlay data, correlating the plurality of the reference overlay data with the baseline data to obtain overlay error, comparing the overlay error with specifications of the target machine, accepting the baseline data when the overlay error is within the specifications, and performing overlay alignment monitoring with the baseline data.