The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2005
Filed:
May. 05, 2003
Bob Baoping He, Madison, WI (US);
Rolf Dieter Schipper, Karlsruhe, DE;
Bob Baoping He, Madison, WI (US);
Rolf Dieter Schipper, Karlsruhe, DE;
Bruker AXS, Inc., Madison, WI (US);
Abstract
A small angle x-ray diffraction scattering system has a vertical orientation, allowing for simplified analysis of liquid samples. The system may function in a beam-up or a beam-down configuration. An x-ray source provides an initial x-ray beam that is directed vertically along a primary beampath to a sample located on a sample support. The small angle scattered x-ray energy travels through a secondary beampath to a detector. The primary and secondary beampaths may be evacuated and separated from a sample chamber by fluid seals. Beam conditioning optics and a collimator may be used in the primary beampath, and a beamstop used in the secondary beampath. The sample chamber may have a microscope or camera, which may be movable, for observing the sample, and a translation stage for moving the sample in at least two dimensions.