The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Aug. 01, 2001
Byung J. Choi, Round Rock, TX (US);
Matthew Colburn, Danbury, CT (US);
S. V. Sreenivasan, Austin, TX (US);
C. Grant Willson, Austin, TX (US);
Todd Bailey, Austin, TX (US);
John Ekerdt, Austin, TX (US);
Byung J. Choi, Round Rock, TX (US);
Matthew Colburn, Danbury, CT (US);
S. V. Sreenivasan, Austin, TX (US);
C. Grant Willson, Austin, TX (US);
Todd Bailey, Austin, TX (US);
John Ekerdt, Austin, TX (US);
Boards of Regents, The University of Texas System, Austin, TX (US);
Abstract
Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile