The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Jan. 19, 2001
Robert L. Gerlach, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Paul P. Tesch, Portland, OR (US);
Richard J. Young, Portland, OR (US);
Clive D. Chandler, Portland, OR (US);
Karl D. Van Der Mast, Portland, OR (US);
Robert L. Gerlach, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Paul P. Tesch, Portland, OR (US);
Richard J. Young, Portland, OR (US);
Clive D. Chandler, Portland, OR (US);
Karl D. van der Mast, Portland, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
A method and apparatus for providing a shaped ion beam having low current density and sharp edges. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by using a two lens system, the first lens imaging the source onto the plane of the second lens and the second lens forming an image of the aperture onto the target plane. Another method is to greatly underfocus a chromatic aberration limited beam. Large beams having uniform current density and sharp edges can be produced. A knife edge beam, having a sharp edge can also be produced.