The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Jun. 26, 2003
Applicant:
Koichiro Narimatsu, Hyogo, JP;
Inventor:
Koichiro Narimatsu, Hyogo, JP;
Assignee:
Renesas Technology Corp., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L023/544 ;
U.S. Cl.
CPC ...
Abstract
A semiconductor device with an enhanced registration accuracy photo-mask used for manufacturing the device and a registration accuracy enhancement method are provided, by detecting lens aberration which causes problems in the process of manufacturing a semiconductor device. The semiconductor device includes an auxiliary mark including an inner mark having stepped portions with four sides as stepped portions to be detected and an outer mark having stepped portion as stepped portions to be detected, provided approximately parallel to stepped portions along four sides of the inner mark.