The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Feb. 12, 2003
Applicants:
Norio Hasegawa, Hinode, JP;
Joji Okada, Tokorozawa, JP;
Toshihiko Tanaka, Tokyo, JP;
Kazutaka Mori, Kokubunji, JP;
Ko Miyazaki, Kokubunji, JP;
Inventors:
Norio Hasegawa, Hinode, JP;
Joji Okada, Tokorozawa, JP;
Toshihiko Tanaka, Tokyo, JP;
Kazutaka Mori, Kokubunji, JP;
Ko Miyazaki, Kokubunji, JP;
Assignee:
Renesas Technology Corp., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/20 ;
U.S. Cl.
CPC ...
Abstract
In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PMis used which is provided partially with light shielding patternsformed of a resist film, in addition to light shielding patterns formed of a metal.