The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
Feb. 27, 2003
Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
Applicants:
Joeri Lof, Eindhoven, NL;
Henricus Wilhelmus Maria Van Buel, Eindhoven, NL;
Cheng-qun Gui, Best, NL;
Fransiscus Godefridus Casper Bijnen, Valkenswaard, NL;
Inventors:
Joeri Lof, Eindhoven, NL;
Henricus Wilhelmus Maria Van Buel, Eindhoven, NL;
Cheng-Qun Gui, Best, NL;
Fransiscus Godefridus Casper Bijnen, Valkenswaard, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ; G03C005/00 ; G01B011/00 ; G03B027/42 ;
U.S. Cl.
CPC ...
Abstract
To calibrate a front-to-backside alignment system a transparent calibration substrate with reference markers on opposite sides is used. A plane plate is inserted to displace the focal position of the alignment system from the top to bottom surface of the calibration substrate.