The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Nov. 21, 2002
Manuel A. Quevedo-lopez, Denton, TX (US);
Robert M. Wallace, Richardson, TX (US);
Mohamed El Bouanani, Denton, TX (US);
Bruce E. Gnade, Lewisville, TX (US);
Manuel A. Quevedo-Lopez, Denton, TX (US);
Robert M. Wallace, Richardson, TX (US);
Mohamed El Bouanani, Denton, TX (US);
Bruce E. Gnade, Lewisville, TX (US);
The Regents of the University of North Texas, Denton, TX (US);
Abstract
A method of processing a substrate is disclosed. The method includes depositing a dielectric layer having a metal oxide on a substrate. A portion of the dielectric layer is removed to form a dielectric structure, thereby exposing a surface of the substrate. For example, the dielectric layer may be patterned using standard photolithographic techniques and etching. An oxide layer is then formed on the exposed surface of the substrate. The oxide layer may be formed using ozone that is generated using ultraviolet radiation. After the oxide layer is formed, it is removed using an etching process.