The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Jul. 11, 2002
Byung Jin Choi, Austin, TX (US);
Mario J. Meissl, Austin, TX (US);
Sidlagata V. Sreenivasan, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Byung Jin Choi, Austin, TX (US);
Mario J. Meissl, Austin, TX (US);
Sidlagata V. Sreenivasan, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
The present invention is directed to methods for patterning a substrate by imprint lithography. An imprint lithography method includes placing a curable liquid on a substrate. A template may be contacted with the curable liquid. Surface forces at the interface of the curable liquid and the template cause the curable liquid to gather in an area defined by a lower surface of the template. Alternately, the curable liquid may fill one or more relatively shallow recesses in the template and the area under the template lower surface. Activating light is applied to the curable liquid to form a patterned layer on the substrate.