The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Jun. 04, 2004
Miyuki Matsuya, Tokyo, JP;
Shinobu Uno, Tokyo, JP;
Miyuki Matsuya, Tokyo, JP;
Shinobu Uno, Tokyo, JP;
JEOL Ltd., Tokyo, JP;
Abstract
An aberration correction method and charged-particle beam instrument with four stages of multipole units. The two central stages of multipole units function as two stages of magnetic quadrupole components for superimposing a magnetic potential distribution analogous with an applied electric potential distribution on this electric potential distribution. The instrument further includes an objective lens, an objective aperture mounted in the optical path for a beam of charged particles, an operation portion for varying the accelerating voltage or the working distance between the objective lens and a specimen, and a control portion for controlling the multipole units according to an operation of the operation portion. When the accelerating voltage or working distance is varied, the resultant magnification of the four stages of multipole units and objective lens mounted behind the units is adjusted to maintain constant at least one of octupole component-activating potentials for correcting third-order aperture aberrations.