The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2005

Filed:

Feb. 27, 2003
Applicants:

John F. Conley, Jr., Camas, WA (US);

Yoshi Ono, Camas, WA (US);

Rajendra Solanki, Portland, OR (US);

Inventors:

John F. Conley, Jr., Camas, WA (US);

Yoshi Ono, Camas, WA (US);

Rajendra Solanki, Portland, OR (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/31 ; H01L021/469 ;
U.S. Cl.
CPC ...
Abstract

An atomic layer deposition method to deposit an oxide nanolaminate thin film is provided. The method employs a nitrate ligand in a first precursor as an oxidizer for a second precursor to form the oxide nanolaminates. Using a hafnium nitrate precursor and an aluminum precursor, the method is well suited for the deposition of a high k hafnium oxide/aluminum oxide nanolaminate dielectric for gate dielectric or capacitor dielectric applications on a hydrogen-terminated silicon surface.

Published as:
US2004171280A1; KR20040077565A; JP2004260168A; TW200424348A; US2005170667A1; US6930059B2; US7053009B2; KR100591507B1; TWI276700B; JP4158975B2;

Find Patent Forward Citations

Conley, Jr., John. (2005). Method for depositing a nanolaminate film by atomic layer deposition (U.S. Patent No. 6930059). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6930059

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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