The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
Sep. 12, 2003
Cassandra M Owen, Chandler, AZ (US);
Wim T Tel, Helmond, NL;
Stephan Ewald Sinkwitz, Solingen, DE;
ASML Netherlands B.V., , NL;
Abstract
A system, apparatus, and method for thermally controlling lithographic chemical processes is disclosed herein. The thermal control system includes a multi-zone thermal sensing unit containing a plurality of thermal sensor elements. These thermal elements are configured to detect the temperature of a plurality of pre-defined zones on the substrates. The system also includes a multi-zone thermal adjustment unit that contains a plurality of thermal coupler elements, which are configured to adjust the temperature of the pre-defined zones. The system further includes a thermal controller unit, operatively and communicatively coupled to the multi-zone thermal sensing unit and the multi-zone thermal adjustment unit. The thermal controller unit receives the detected temperature from the multi-zone thermal sensing unit, processes the detected temperature information, generates temperature control information based on the processed temperature information, and communicates the temperature control information to the multi-zone thermal adjustment unit to adjust the temperatures of the pre-defined zones.