The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2005

Filed:

Jun. 25, 2003
Applicants:

Miyuki Matsuya, Tokyo, JP;

Fumio Hosokawa, Tokyo, JP;

Inventors:

Miyuki Matsuya, Tokyo, JP;

Fumio Hosokawa, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21R005/10 ; G21K001/08 ;
U.S. Cl.
CPC ...
Abstract

A charged-particle beam instrument with an aberration corrector which comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central quadrupole elements of the four stages of electrostatic quadrupole elements on this electric potential distribution, and four stages of electrostatic octopole elements for superimposing an electric octopole potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements.


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