The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Sep. 04, 2002
Tom A. Kamp, San Jose, CA (US);
Richard Gottscho, Pleasanton, CA (US);
Steve Lee, Fremont, CA (US);
Chris Lee, Oakland, CA (US);
Yoko Yamaguchi, Fremont, CA (US);
Vahid Vahedi, Albany, CA (US);
Aaron Eppler, Fremont, CA (US);
Tom A. Kamp, San Jose, CA (US);
Richard Gottscho, Pleasanton, CA (US);
Steve Lee, Fremont, CA (US);
Chris Lee, Oakland, CA (US);
Yoko Yamaguchi, Fremont, CA (US);
Vahid Vahedi, Albany, CA (US);
Aaron Eppler, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.