The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Jul. 02, 2003
Jun Hatakeyama, Niigata-ken, JP;
Takanobu Takeda, Niigata-ken, JP;
Toshinobu Ishihara, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Takanobu Takeda, Niigata-ken, JP;
Toshinobu Ishihara, Niigata-ken, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Silicon-containing polymers comprising recurring units of formula (1) are novel wherein Ris a single bond or alkylene, Ris hydrogen or alkyl, R, Rand Rare alkyl, haloalkyl, aryl or silicon-containing group, Ris hydrogen, methyl, cyano or —C(═O)ORwherein Ris hydrogen, alkyl or acid labile group, Ris alkyl, —NRRor —ORwherein R, Rand Rare hydrogen or alkyl, a and b are positive numbers satisfying 0<a+b≦1. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile