The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
May. 27, 2003
Applicants:
S. V. Sreenivasan, Austin, TX (US);
Byung J. Choi, Round Rock, TX (US);
Matthew Colburn, Austin, CT (US);
Todd Bailey, Austin, TX (US);
Inventors:
S. V. Sreenivasan, Austin, TX (US);
Byung J. Choi, Round Rock, TX (US);
Matthew Colburn, Austin, CT (US);
Todd Bailey, Austin, TX (US);
Assignee:
Board of Regents, The University of Texas System, Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ; G03B017/00 ;
U.S. Cl.
CPC ...
Abstract
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.