The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Apr. 22, 2002
Ta-min Lin, Hsinchu, TW;
Szu-yao Wang, Hsin-Chu, TW;
Chia-fu Lin, Hsin-Chu, TW;
Kai-ming Ching, Taiping, TW;
Wen-hsiang Tseng, Hsinchu, TW;
Ta-Min Lin, Hsinchu, TW;
Szu-Yao Wang, Hsin-Chu, TW;
Chia-Fu Lin, Hsin-Chu, TW;
Kai-Ming Ching, Taiping, TW;
Wen-Hsiang Tseng, Hsinchu, TW;
Taiwan Semiconductor, Hsin Chu, TW;
Abstract
A flush system comprising a network of conduits, valves and screens that can be interposed between the process container and solvent re-claim tank components of a dry film photoresist (DFR) remover system, for example, that is used in the processing and packaging of integrated circuit chips. By operation of the valves in the flush system, DFR particles can be removed from the DFR remover system in order to prevent or minimize particle clogging of a particle filter in the DFR remover system. The screens in the flush system can be periodically cleaned by reverse flow of solvent or by operation of a nitrogen and DI (deionized) water purge system.