The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Nov. 12, 2002
Eric J. Strang, Chandler, AZ (US);
Thomas F. A. Bibby, Jr., St. Albans, VT (US);
Wayne L. Johnson, Phoenix, AZ (US);
Eric J. Strang, Chandler, AZ (US);
Thomas F. A. Bibby, Jr., St. Albans, VT (US);
Wayne L. Johnson, Phoenix, AZ (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of adjusting the relative thickness of an electrode assembly () in a plasma processing system () capable of supporting a plasma () in a reactor chamber (). The electrode assembly is arranged in the reactor chamber and includes at least one electrode having a lower surface that may have defined by at least one sacrificial protective plate (). The electrode has a nonuniform thickness resulting from a plasma processing operation performed in the reactor chamber. The method includes a step of forming a plasma () designed to selectively etch the at least one electrode at the lower surface, followed by a step of etching the electrode with the aid of the plasma to reduce the nonuniformity in thickness (T(X,Z)) of the at least one electrode. The thickness of the electrode may be measured in situ using an acoustic transducer () during the processing of workpieces as well as during the restorative plasma etching of the electrode.