The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Jul. 07, 2004
Elmar Platzgummer, Vienna, AT;
Gerhard Stengl, Wernberg, AT;
Hans Loeschner, Vienna, AT;
IMS-Ionen Mikrofabrikations Systeme GmbH, Vienna, AT;
Abstract
A particle-beam exposure apparatus () for irradiating a target () by means of a beam () of energetic electrically charged particles comprises: an illumination system () for generating and forming said particles into a directed beam (); a pattern definition means () located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam () emerging from the pattern definition means through the apertures; and a projection system () positioned after the pattern definition means () for projecting the patterned beam () onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/deceleration means () containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.