The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Feb. 21, 2003
Satish Venkatesh Herekar, Palo Alto, CA (US);
Daniel R. Neal, Tijeras, NM (US);
Richard James Copland, Albuquerque, NM (US);
David Neal, Albuquerque, NM (US);
Satish Venkatesh Herekar, Palo Alto, CA (US);
Daniel R. Neal, Tijeras, NM (US);
Richard James Copland, Albuquerque, NM (US);
David Neal, Albuquerque, NM (US);
WaveFront Sciences, Inc., Albuquerque, NM (US);
Abstract
A real-time refractory control system includes a laser refractive surgery instrument for modifying the refraction of the eye, an objective diagnostic apparatus for measuring the refraction and aberrations of the eye, and an aperture-sharing element to inject a refractive surgery beam and a monitoring diagnostic beam. An associated method of adjusting a refraction of an eye, includes: performing a procedure to modify the refraction of the eye; while the procedure is being performed, measuring the refraction and/or an aberration of the eye; and terminating the procedure when a change in the measured refraction and/or the measured aberration reaches a desired value.