The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2005

Filed:

Jun. 10, 2004
Applicants:

BO H. Vanderberg, Gloucester, MA (US);

Andrew M. Ray, Newburyport, MA (US);

Kevin W. Wenzel, Belmont, MA (US);

Inventors:

Bo H. Vanderberg, Gloucester, MA (US);

Andrew M. Ray, Newburyport, MA (US);

Kevin W. Wenzel, Belmont, MA (US);

Assignee:

Axcelis Technologies, Inc., Beverly, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/324 ;
U.S. Cl.
CPC ...
Abstract

Ion implantation systems and scanning systems therefor are provided, in which focus adjustment apparatus is provided to dynamically adjust a focal property of an ion beam to compensate for at least one time varying focal property of a scanner. Methods are provided for providing a scanned ion beam to a workpiece, comprising dynamically adjusting a focal property of an ion beam, scanning the ion beam to create a scanned ion beam, and directing the scanned ion beam toward a workpiece.


Find Patent Forward Citations

Vanderberg, Bo. (2005). Ion beam scanning systems and methods for improved ion implantation uniformity (U.S. Patent No. 6903350). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6903350

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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