The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Jun. 10, 2004
BO H. Vanderberg, Gloucester, MA (US);
Andrew M. Ray, Newburyport, MA (US);
Kevin W. Wenzel, Belmont, MA (US);
Bo H. Vanderberg, Gloucester, MA (US);
Andrew M. Ray, Newburyport, MA (US);
Kevin W. Wenzel, Belmont, MA (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
Ion implantation systems and scanning systems therefor are provided, in which focus adjustment apparatus is provided to dynamically adjust a focal property of an ion beam to compensate for at least one time varying focal property of a scanner. Methods are provided for providing a scanned ion beam to a workpiece, comprising dynamically adjusting a focal property of an ion beam, scanning the ion beam to create a scanned ion beam, and directing the scanned ion beam toward a workpiece.