The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Jul. 02, 2003
Applicants:
Takanobu Takeda, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Toshinobu Ishihara, Niigata-ken, JP;
Inventors:
Takanobu Takeda, Niigata-ken, JP;
Jun Hatakeyama, Niigata-ken, JP;
Toshinobu Ishihara, Niigata-ken, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J007/04 ;
U.S. Cl.
CPC ...
Abstract
Silicon-containing polymers comprising recurring units of three components represented by the general formula (1) are novel wherein R, Rand Rare hydrogen or Calkyl, R, Rand Rare hydrogen, Calkyl or haloalkyl, or Caryl, Ris Calkyl, n is 1 to 5, p, q and r are positive numbers. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching