The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Mar. 28, 2003
Steven B. Herschbein, Hopewell Junction, NY (US);
Ville S. Kiiskinen, Newburgh, NY (US);
Chad Rue, Poughkeepsie, NY (US);
Carmelo F. Scrudato, Ossining, NY (US);
Michael R. Sievers, Poughkeepsie, NY (US);
Steven B. Herschbein, Hopewell Junction, NY (US);
Ville S. Kiiskinen, Newburgh, NY (US);
Chad Rue, Poughkeepsie, NY (US);
Carmelo F. Scrudato, Ossining, NY (US);
Michael R. Sievers, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention is directed to methods for editing copper features embedded within an organic body by exposing at least a portion of a top surface of the copper feature, forming a mill box there-over and then simultaneously milling both the copper feature and any organic material exposed through the mill box in a single step using an ion beam in combination with a XeFgas for a dwell time of at least 10 milliseconds. The invention dramatically increases the efficiency of Focused Ion Beam milling of copper features embedded in organic layers by milling these features in a gas-depleted environment at significantly increased dwell time while avoiding the problems of graphitization, destruction of the organic layer and metal redeposition.