The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Oct. 09, 2002
Hideto Kato, Gunma-ken, JP;
Kazumi Noda, Gunma-ken, JP;
Toshihiko Fujii, Gunma-ken, JP;
Kazuhiro Arai, Gunma-ken, JP;
Satoshi Asai, Gunma-ken, JP;
Hideto Kato, Gunma-ken, JP;
Kazumi Noda, Gunma-ken, JP;
Toshihiko Fujii, Gunma-ken, JP;
Kazuhiro Arai, Gunma-ken, JP;
Satoshi Asai, Gunma-ken, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1):wherein Rto Rare monovalent C-Chydrocarbon, n is an integer of 1-1,000, and X isand having a Mw of 500-200,000, (B) a formalin-modified or formalin-alcohol-modified amino condensate, a phenol compound having on the average at least two methylol or alkoxymethylol radicals, or an epoxy compound having on the average at least two epoxy radicals, (C) a photoacid generator, and (D) a silicon compound of the formula: (R)Si(OR)wherein Ris monovalent C-Chydrocarbon, Ris C-Calkyl, m is 0-2, forms cured pattern films having dry etch resistance and improved adhesion to substrates.