The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Jan. 17, 2002
Applicants:
Tetsuji Togawa, Tokyo, JP;
Ikutaro Noji, Tokyo, JP;
Shunichiro Kojima, Tokyo, JP;
Nobuyuki Takada, Tokyo, JP;
Inventors:
Tetsuji Togawa, Tokyo, JP;
Ikutaro Noji, Tokyo, JP;
Shunichiro Kojima, Tokyo, JP;
Nobuyuki Takada, Tokyo, JP;
Assignee:
Ebara Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B007/00 ;
U.S. Cl.
CPC ...
Abstract
A dressing apparatus dresses a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer in a polishing apparatus. The dressing apparatus comprises a dresser body () connected to a dresser drive shaft () which is vertically movable, a dresser plate () which is vertically movable with respect to the dresser body (), and a dressing member () held by the dresser plate () for dressing the polishing surface ().