The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Feb. 02, 2004
Yoshio Homma, Hinode, JP;
Seiichi Kondo, Kokubunji, JP;
Noriyuki Sakuma, Hachioji, JP;
Youhei Yamada, Kodaira, JP;
Takeshi Kimura, Higashimurayama, JP;
Hiroki Nezu, Hamura, JP;
Yoshio Homma, Hinode, JP;
Seiichi Kondo, Kokubunji, JP;
Noriyuki Sakuma, Hachioji, JP;
Youhei Yamada, Kodaira, JP;
Takeshi Kimura, Higashimurayama, JP;
Hiroki Nezu, Hamura, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
In a polishing apparatus having a cover body with fluid pressing mechanism, during polishing, vibration and migration of sticking portion between a retainer and a membrane generated in downstream of rotation of a polishing platen is prevented by reducing sticking force between the retainer and the membrane to less than force needed to wafer polishing with rotation of the cover body.