The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Dec. 15, 2003
Joost Jeroen Ottens, Veldhoven, NL;
Hendrik Anthony Johannes Neerhof, Eindhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Marco Le Kluse, Maassluis, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Hendrik Anthony Johannes Neerhof, Eindhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Marco Le Kluse, Maassluis, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.