The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Apr. 29, 2003
Seiro Murakami, Chiba, JP;
Takaharu Miura, Yamato, JP;
Akikazu Tanimoto, Yokohama, JP;
Yutaka Ichihara, Yokohama, JP;
Hideo Mizutani, Yokohama, JP;
Seiro Murakami, Chiba, JP;
Takaharu Miura, Yamato, JP;
Akikazu Tanimoto, Yokohama, JP;
Yutaka Ichihara, Yokohama, JP;
Hideo Mizutani, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A mask stage RSand a substrate stage WSare synchronously moved, and a mask stage RSand a substrate stage RSare synchronously moved, in a state in which a mask on the mask stage RSand a mask on the mask stage RSare irradiated with illumination light beams from illumination optical systems IOP, IOPrespectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RSand the mask stage RSin mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS, WSconcurrently with the exposure operation.