The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Jun. 13, 2001
Robin Cheung, Cupertino, CA (US);
Daniel A. Carl, Pleasanton, CA (US);
Liang-yuh Chen, Foster City, CA (US);
Yezdi Dordi, Palo Alto, CA (US);
Paul F. Smith, Campbell, CA (US);
Ratson Morad, Palo Alto, CA (US);
Peter Hey, Sunnyvale, CA (US);
Ashok Sinha, Palo Alto, CA (US);
Robin Cheung, Cupertino, CA (US);
Daniel A. Carl, Pleasanton, CA (US);
Liang-Yuh Chen, Foster City, CA (US);
Yezdi Dordi, Palo Alto, CA (US);
Paul F. Smith, Campbell, CA (US);
Ratson Morad, Palo Alto, CA (US);
Peter Hey, Sunnyvale, CA (US);
Ashok Sinha, Palo Alto, CA (US);
Applied Materials Inc., Santa Clara, CA (US);
Abstract
An apparatus and method is provided for analyzing or conditioning an electrochemical bath. One aspect of the invention provides a method for analyzing an electrochemical bath in an electrochemical deposition process including providing a first electrochemical bath having a first bath composition, utilizing the first electrochemical bath in an electrochemical deposition process to form a second electrochemical bath having a second bath composition and analyzing the first and second compositions to identify one or more constituents generated in the electrochemical deposition process. Additive material having a composition that is substantially the same as all or at least some of the one or more constituents generated in the electrochemical deposition process may be added to another electrochemical bath to produce a desired chemical composition. The constituents may be added at the beginning of the use of the bath to initially condition the electrochemical bath or may be added, preferably either continuously or periodically, during the electrochemical deposition process.