The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Mar. 26, 2003
Shui-hung Chen, Hsin-Chu, TW;
Jian-hsing Lee, Hsin-Chu, TW;
Jiaw-ren Shih, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Abstract
A multi-level metal interconnect structure and method for forming the same for improving a resistance of CMOS transistors to electrostatic discharge (ESD) transient events is disclosed. A semiconductor device including at least one NMOS transistor electrically connected along at least one circuit pathway to an input/output signal source and a reference voltage potential; and, electrically connecting at least the input/output signal source to the at least one NMOS transistor with a metal interconnect line extended in length by compacting at least a portion of the metal interconnect line length portion into a serpentine shape within a predetermined volume of the semiconductor device.