The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Jun. 17, 2003
Applicants:
Abaneshwar Prasad, Naperville, IL (US);
Roland K. Sevilla, Aurora, IL (US);
Michael S. Lacy, Naperville, IL (US);
Inventors:
Abaneshwar Prasad, Naperville, IL (US);
Roland K. Sevilla, Aurora, IL (US);
Michael S. Lacy, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D011/00 ;
U.S. Cl.
CPC ...
Abstract
The invention is directed to a multi-layer polishing pad for chemical-mechanical polishing comprising a polishing layer and a bottom layer, wherein the polishing layer and bottom layer are joined together without the use of an adhesive. The invention is also directed to a polishing pad comprising an optically transmissive multi-layer polishing pad material, wherein the layers of the polishing pad material are joined together without the use of an adhesive.