The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Sep. 24, 2002
Hideo Tsuchiya, Kawasaki, JP;
Shinji Sugihara, Tokyo, JP;
Kyoji Yamashita, Yokohama, JP;
Toshiyuki Watanabe, Yokohama, JP;
Kazuhiro Nakashima, Kawasaki, JP;
Hideo Tsuchiya, Kawasaki, JP;
Shinji Sugihara, Tokyo, JP;
Kyoji Yamashita, Yokohama, JP;
Toshiyuki Watanabe, Yokohama, JP;
Kazuhiro Nakashima, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.