The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Jan. 24, 2003
Akira Kagoshima, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Toshio Masuda, Toride, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Junichi Tanaka, Tsuchiura, JP;
Natsuyo Morioka, Tokyo, JP;
Kenji Tamaki, Yokohama, JP;
Akira Kagoshima, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Toshio Masuda, Toride, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Junichi Tanaka, Tsuchiura, JP;
Natsuyo Morioka, Tokyo, JP;
Kenji Tamaki, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing control system and method which can suppress influences caused by disturbances. The control system includes a plasma processor for performing processing operation over a sample accommodated within a vacuum processing chamber, a sensor for monitoring process parameters during processing operation of the plasma processor, a processed-result estimation model for estimating a processed result on the basis of a monitored output of the sensor and a preset processed-result prediction equation, and an optimum recipe calculation model for calculating correction values of processing conditions on the basis of an estimated result of the processed-result estimation model in such a manner that the processed result becomes a target value. The plasma processor is controlled on the basis of a recipe generated by the optimum recipe calculation model.