The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2005

Filed:

Dec. 20, 2001
Applicants:

Masaru Seita, Saitama, JP;

Hideki Tsuchida, Hasuda, JP;

Shinjiro Hayashi, Saitama, JP;

Inventors:

Masaru Seita, Saitama, JP;

Hideki Tsuchida, Hasuda, JP;

Shinjiro Hayashi, Saitama, JP;

Assignee:

Shipley Company, L.L.C., Marlborough, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D003/38 ; C25D021/18 ; C23C016/00 ;
U.S. Cl.
CPC ...
Abstract

Disclosed are an electrolytic copper plating solution containing a specific sulfur-containing compound and a thiol-reactive compound, and an electrolytic copper plating process using such an electrolytic copper plating solution. The present invention can prevent the copper layer on the resulting composite material from forming aggregation and, when the plating is intended to fill vias, make it possible to achieve the via-filling without voids. The present invention also relates to a method for controlling the electrolytic copper plating solution by using an amount of a specific decomposition product of the sulfur-containing compound as an index.


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