The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Nov. 07, 2001
Fang-cheng Chang, Sunnyvale, CA (US);
Christophe Pierrat, Santa Clara, CA (US);
J. Tracy Weed, San Jose, CA (US);
Fang-Cheng Chang, Sunnyvale, CA (US);
Christophe Pierrat, Santa Clara, CA (US);
J. Tracy Weed, San Jose, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
A method of evaluating a stepper process affected by lens aberration is provided. The method includes receiving, from a facilitator responding to a request, a set of optical models including lens aberration information, wherein the lens aberration information is difficult to extract from the optical models. A decision can be made using the set of optical models. The decision could include determining which stepper(s) can be used (or should be avoided) with a mask, a layout, a process, and/or a chemistry. The decision could include ranking a plurality of steppers based on mask data to determine the best stepper (or next best steppers) to use.