The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Jun. 18, 2002
Jan Evert Van Der Werf, Waarle, NL;
Erik Roelof Loopstra, Heeze, NL;
Hans Meiling, Bilthoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Jan Evert Van Der Werf, Waarle, NL;
Erik Roelof Loopstra, Heeze, NL;
Hans Meiling, Bilthoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.