The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Nov. 20, 2002
Applicants:
Masahiko Yasuda, Kawasaki, JP;
Osamu Furukawa, Tokyo, JP;
Masaharu Kawakubo, Kawasaki, JP;
Hiroki Tateno, Kawasaki, JP;
Nobutaka Magome, Kawasaki, JP;
Inventors:
Masahiko Yasuda, Kawasaki, JP;
Osamu Furukawa, Tokyo, JP;
Masaharu Kawakubo, Kawasaki, JP;
Hiroki Tateno, Kawasaki, JP;
Nobutaka Magome, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyom, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ;
U.S. Cl.
CPC ...
Abstract
A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement of a plurality of shot areas on the substrate, and the parameters in the other set relate to the shot areas per se. The mask and the substrate are moved relatively in accordance with the determined parameters.