The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2005

Filed:

Oct. 27, 2000
Applicants:

Byung Jin Choi, Round Rock, TX (US);

Sidlgata V. Sreenivasan, Austin, TX (US);

Stephen C. Johnson, Austin, TX (US);

Inventors:

Byung Jin Choi, Round Rock, TX (US);

Sidlgata V. Sreenivasan, Austin, TX (US);

Stephen C. Johnson, Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02N002/00 ;
U.S. Cl.
CPC ...
Abstract

Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.


Find Patent Forward Citations

Choi, Byung. (2005). High precision orientation alignment and gap control stages for imprint lithography processes (U.S. Patent No. 6873087). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6873087

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…