The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Sep. 11, 2000
Shin Harada, Osaka, JP;
Kenichi Hirotsu, Osaka, JP;
Hiroyuki Matsunami, Yawata, JP;
Tsunenobu Kimoto, Kyoto, JP;
Shin Harada, Osaka, JP;
Kenichi Hirotsu, Osaka, JP;
Hiroyuki Matsunami, Yawata, JP;
Tsunenobu Kimoto, Kyoto, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
A junction field effect transistor (JFET) is provided that is capable of a high voltage resistance, high current switching operation, that operates with a low loss, and that has little variation. This JFET is provided with a gate region () of a second conductivity type provided on a surface of a semiconductor substrate, a source region () of a first conductivity type, a channel region () of the first conductivity type that adjoins the source region, a confining region () of the second conductivity type that adjoins the gate region and confines the channel region, a drain region () of the first conductivity type provided on a reverse face, and a drift region () of the first conductivity type that continuously lies in a direction of thickness of the substrate from a channel to a drain. A concentration of an impurity of the first conductivity type in the drift region and the channel region is lower than a concentration of an impurity of the first conductivity type in the source region and the drain region and a concentration of an impurity of the second conductivity type in the confining region.