The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6869734 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 22, 2005

Filed:

Dec. 30, 2002
Applicants:

Christopher F. Lyons, Fremont, CA (US);

Cyrus E. Tabery, Sunnyvale, CA (US);

Richard J. Huang, Cupertino, CA (US);

Inventors:

Christopher F. Lyons, Fremont, CA (US);

Cyrus E. Tabery, Sunnyvale, CA (US);

Richard J. Huang, Cupertino, CA (US);

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract

An exemplary embodiment relates to a mask for integrated circuit fabrication equipment. The mask includes a multilayer film and an amorphous carbon layer above the multilayer film. The multilayer film is at least partially relatively reflective to radiation having a wavelength of less than 70 nanometers.


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