The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Dec. 30, 2002
Applicants:
Christopher F. Lyons, Fremont, CA (US);
Cyrus E. Tabery, Sunnyvale, CA (US);
Richard J. Huang, Cupertino, CA (US);
Inventors:
Christopher F. Lyons, Fremont, CA (US);
Cyrus E. Tabery, Sunnyvale, CA (US);
Richard J. Huang, Cupertino, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
An exemplary embodiment relates to a mask for integrated circuit fabrication equipment. The mask includes a multilayer film and an amorphous carbon layer above the multilayer film. The multilayer film is at least partially relatively reflective to radiation having a wavelength of less than 70 nanometers.
Lyons, Christopher. (2005). Euv reflective mask having a carbon film and a method of making such a mask (U.S. Patent No. 6869734). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6869734
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile