The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Sep. 17, 2002
Harry Bauer, Aalen, DE;
Matthias Heller, Hohenahr, DE;
Hans-jochen Paul, Aalen, DE;
Jens Ullmann, Oberkochen, DE;
Patrick Scheible, Aalen, DE;
Christoph Zaczek, Heubach, DE;
Harry Bauer, Aalen, DE;
Matthias Heller, Hohenahr, DE;
Hans-Jochen Paul, Aalen, DE;
Jens Ullmann, Oberkochen, DE;
Patrick Scheible, Aalen, DE;
Christoph Zaczek, Heubach, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method for coating substrates () for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system () that has a rotating planet carrier () and several planets (), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks () that allow controlling the radial variation in physical film thickness is arranged between a source () of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.